Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry /
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| Format: | Government Document Microfilm Book |
| Language: | English |
| Published: |
Gaithersburg, MD : Washington, DC :
U.S. Department of Commerce, Technology Administration, National Institute of Standards and Technology ; For sale by the Supt. of Docs., U.S. G.P.O.,
1994.
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| Series: | NIST special publication ;
260-121. Standard reference materials. |
| Subjects: |